NE-PE13FH RF plasma degumming system NE-PE13FH
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DESCRIPTION

Radio frequency plasma degumming machine is a kind of equipment specially used to remove the glue layer or polymer substance on the surface of the material. It uses the plasma generated by high-frequency electric field to carry out chemical reaction, converting various polymer substances into low-molecular substances that are easy to handle, thereby achieving the purpose of degumming. This process is usually called ashing process. Radio frequency plasma degumming technology is an efficient and environmentally friendly degumming method. It does not require the use of chemical solvents and water, and can effectively avoid pollution and waste disposal problems. RF plasma degumming machines usually include RF power supply, reaction chamber, gas control system and vacuum system. RF power supply is used to generate high-frequency electric field. The reaction chamber is the place where plasma is generated. The gas control system is used to control the type and flow of reaction gas. The vacuum system is used to maintain the low-pressure environment in the chamber to promote the formation of plasma and the progress of chemical reactions. There are several electrode plates built into the vacuum chamber of the equipment, which can be used for small-batch degumming to improve production efficiency.


The photoresist is bombarded and removed by gas ionization to ensure the integrity of the device. The RF plasma debonding machine is suitable for various substrates such as glass, metal seed layer, silicon wafer, piezoelectric ceramics, etc. Plasma bombardment can not only remove the residual glue on the surface, but also activate the substrate and improve its surface hydrophilicity.

PARAMETER

ModelNE-PE13FH
Power
0-300W adjustable
Generator
RF 13.56 MHz, automatic impedance matching
Chamber material
316 Stainless Steel
Chamber volume13.5L
Chamber size
240(L)*280(D)*200(H)mm
Effective treatment area205(W)×205(D)×30.5(H)mm (8-inch wafer and below)
Number of processing layers3 layers
gas flow controllerMFC mass flow meter, 0-300ML
Number of air paths2 channels (can be increased)
Ultimate vacuum degree1PA
Vacuum measuring systemPirani vacuum silicon tube Measuring range 5×10 -2 ~1.0×10 5 Pa
Vacuum pump
Dry pump/Oil pump (optional)
Control system
PLC+touch screen
Power supply220V
Dimensions640mm(W)×665mm(D) ×580 mm(H)


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
Custom Plasma Equipment

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