DESCRIPTION
The small laboratory plasma system is to ionize the gas into a plasma state by applying sufficient energy to the gas, and use the properties of these active components to treat the surface of the sample, so as to achieve the purpose of cleaning, modification, and photoresist ashing.
The surface modification of the material by plasma changes the microstructure of the material surface and the chemical composition of the material surface, including the surface chemical composition, wettability, surface microstructure, etc., to achieve the purpose of surface modification of the material. The surface chemical composition of the material modified by low temperature plasma changes, and new chemical elements and chemical active functional groups are introduced on the surface of the material. The wettability of the material surface changes, and the hydrophilicity or hydrophobicity increases. The surface morphology of the material changes, and the surface roughness of the material usually increases.
PARAMETER
Model | NE-PE10F |
Plasma generator power | 0-300W(Adjusted) |
Plasma generator frequency | 13.56MHz |
Cavity material | 316 stainless steel, military grade seal |
Cavity volume | 10L |
Discharge electrode | 2 aluminum alloy special electrode + 1 tray |
Cavity size | 230( L)×270(D)×175(H)mm |
Effective processing range | 208(W)*215(D)mm |
Monolayer spacing | H:55mm |
Gas channel | 2 channels |
Weight | 50KG(Including vacuum pump) |
Overall dimensions | 600mm(L)×600mm(W) ×550mm(H) |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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