Inductively Coupled Plasmas ( ICP )

The discharge in which the RF power is loaded into the non-resonant induction coil and the energy is transmitted to the plasma through inductive coupling is called inductively coupled plasmas ( ICP ), as shown in Fig.1.1. In the inductively coupled discharge device, the radio frequency current is loaded into the coil, and the alternating magnetic field is generated in the reaction chamber through the quartz glass dielectric window, and the alternating electric field is induced, so that the gas is ionized and the high density plasma is generated.

Inductively Coupled Plasmas ( ICP )

In this way, the inductive coupling coil is installed outside the vacuum chamber, there is no electrode inside, and there is no sputtering pollution problem. At the same time, the plasma generated by the inductive coupling is relatively uniform, which can meet the requirements of high-purity material preparation and high-precision cleaning.