NE-MW05 is a compact, high-performance small desktop microwave plasma cleaning machine designed for R&D and small-scale production applications. The equipment uses the latest high-performance components and software to accurately control process parameters. It is mainly used in semiconductors, optics, electronics, biochips and other fields to perform micro-cleaning, activation, modification, deoxidation, degumming and other applications on the surface of various materials.

NE-MW05 relies on microwave plasma technology. Microwave plasma has high ionization and dissociation degree, which can produce more active particles, thereby improving the cleaning rate. At the same time, the microwave plasma cleaning machine itself has no internal electrodes, thus eliminating the electrode material pollution caused by the presence of electrodes in the discharge area, which is conducive to high-purity chemical reactions and prolongs the service life, and is suitable for the preparation and treatment of high-purity materials. In addition, the entire discharge process does not require positive and negative electrodes, the self-bias voltage generated is extremely small, and the ion energy in the plasma is low, which minimizes the exposure of the product to electrostatic discharge (ESD) and fundamentally avoids product surface damage. Therefore, microwave plasma cleaning technology is very suitable for application in semiconductor chip packaging.