NE-OIC04 Plasma cleaner NE-OIC04
Home / Products / Low Pressure Plasma System / Online / Plasma cleaner NE-OIC04

DESCRIPTION

In-Line Lead Frame Plasma Cleaning System is primarily composed of loading/unloading mechanisms, pushing mechanisms, material transfer mechanisms, and vacuum chamber modules. It is designed for pre-cleaning processes in IC packaging, including die attachment (dispensing), wire bonding, and encapsulation, significantly enhancing adhesion strength and bonding reliability to optimize packaging yield.


Existing Chamber-Type Batch Plasma Cleaning Systems are predominantly batch-operated with low automation and production efficiency. Their design typically features a four-sided open cartridge structure with side panels on both sides, where workpieces are vertically stacked with spacing. During cleaning, shadowing effects caused by the cartridge sidewalls or insufficient spacing between adjacent workpieces (e.g., <5mm gaps) result in incomplete plasma exposure, preventing full coverage of all frame surface areas.


In-Line Sheet-Type Plasma Cleaning System utilizes a loading mechanism (robotic arm and conveyor belt) to individually extract lead frames from the cartridge and sequentially place them onto a flat carrier platform. The platform is then transferred into the cleaning chamber for plasma treatment. During the process, no obstructions exist on the front, top, or bottom sides of the lead frames, enabling full-surface plasma exposure for thorough and uniform cleaning. After cleaning, the unloading mechanism (robotic arm and conveyor belt) reloads the processed lead frames back into the cartridge, achieving significantly improved cleaning effectiveness and uniformity.

PARAMETER

ModelNE-OIC04
Plasma Generator 
13.56 MHz, 1000W (Continuously Adjustable)
Low Pressure Level<20Pa
Cleaning Product Dimensions
L:160mm-300mm,W:25mm-100mm
Number of Channels4, with 5 Adjustable Width Configurations
RF Cleaning TimeContinuously adjustable
Process GasStandard Configuration with Argon (Ar) (Gas Purity Requirement >99.99%)
UPH500units/h
Cleaning EffectivenessWater Contact Angle Test: 10–25°
(Actual results dependent on customer-specific product validation)
Dimensions
L*W*H:1850mm * 1350mm * 1900mm
Power
380V、40A、50 Hz


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

RELATED PRODUCTS

Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
Custom Plasma Equipment

Copyright@ NAEN Technology Co., Ltd. All Rights Reserved.| Sitemap | Powered by Reanod  

whatsapp
whatsapp