Semiconductor packaging Online four-track low pressure plasma cleaning machine
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DESCRIPTION

The online four-track plasma cleaning machine is mainly used for the surface cleaning of semiconductor package lead frames and LED package brackets. The equipment is mainly composed of loading and unloading systems, material transmission systems, plasma cleaning systems, visual monitoring systems, tray moving mechanisms, transmission mechanisms, material clamping mechanisms, push rod mechanisms, sensor detection systems, control panels, operating tables and equipment frames. The system adopts a fully automatic operation mode and can be connected with upstream and downstream production processes to meet the large-scale production requirements of the device packaging industry. It can completely remove micro residual particles, oxides and organic pollutants with a size of less than 1μm, greatly improve the surface properties, and improve the reliability of subsequent processes such as welding, packaging and bonding, thereby ensuring the high precision and high reliability of electronic products in harsh environmental conditions.


The equipment realizes automatic transmission and cleaning of lead frames. It automatically takes out the lead frames from the material box and performs plasma cleaning to remove surface contamination of the material and improve surface activity, and then automatically puts them back into the material box. There is no human interference in the whole process. The track width is adjustable and can be compatible with products of different specifications and sizes. Independent sheet cleaning greatly improves cleaning uniformity.


As a precision dry cleaning equipment, the online four-track plasma cleaning equipment can effectively remove pollutants and improve the surface properties of materials. It has the advantages of high degree of automation, high cleaning efficiency, high equipment cleanliness and wide adaptability.

PARAMETER

DimensionsL*W*H:2000mm* 1200mm* 1700mm
Power
1PH220V、40A、50 Hz
Compressed air0.4-0.6MPa
Environmental requirementsTemperature: 15~25℃ Humidity: 40~60%
Process GasStandard Ar
RF Power1KW,13.56MHz
Vacuum PumpDry Pump
Control ModePC+Human Machine Interface
Washable product specificationsL120mm-270mm, W 40mm-83mm
Number of tracks4 (can be increased)


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Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
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