NE-PE30F low-pressure  plasma treatment system is mainly used for plasma cleaning, material surface activation and improvement of material surface adhesion. It is used in semiconductor manufacturing, microelectronic packaging and life science equipment. It consists of 13.56 MHz RF power generator, electronic control system, automatic matching system and plasma discharge chamber. The external vacuum pump system can be connected to different gases, such as argon, oxygen, and fluorinated gases. The brackets with adjustable plate spacing on both sides of the discharge chamber can be used to place the plates. At the same time, the setting of NE-PE30F discharge parameters can be directly operated on the operating panel, including the setting of discharge power, flow rate and discharge time.