DESCRIPTION
NE-PE40F is a small and medium-sized vacuum plasma cleaning machine, which is widely used in scientific research institutions, enterprise R&D units and small batch production proofing. Plasma cleaning machine is a cleaning equipment that uses plasma to remove pollutants on the surface of materials. The equipment adopts PLC touch screen control and automatic matching power supply. It quickly generates a vacuum pressure of 1-20 Pa through a vacuum pump. At the same time, according to customer process requirements, different mixed process gases are introduced into the vacuum reaction chamber to ionize the introduced process gas to generate plasma. During the working process, the high-energy particles in the plasma react chemically or physically bombard the surface pollutants, causing the pollutants to dissociate, oxidize or reduce to form volatile products, thereby achieving the effect of cleaning the surface pollutants.
NE-PE40F has the following advantages: (1) The plasma cleaning machine has high cleaning efficiency and a wide range of applications; (2) There are no requirements for the appearance, size, material, etc. of the cleaning sample; (3) During the cleaning process, the temperature rise is relatively small and can basically reach room temperature; (4) The RF power can be continuously adjusted, and the efficient special electrode is the guarantee for the generation of uniform plasma; (5) The unique overload, overheating and short-circuit protection circuit can ensure the stability and safety of the RF power supply; (6) The equipment adopts a modular design, and installation and maintenance are extremely simple.
PARAMETER
Model | NE-PE40F |
Plasma Generator Frequency | 13.56MHz |
Chamber Material | Stainless steel/aluminum alloy (optional) |
Vacuum Pump | Oil pump/dry pump (optional) |
Ultimate vacuum degree | 1Pa |
Power | 0-300W (adjustable) |
Chamber Size | 350(L)*405(D)*300(H)mm |
Chamber Volume | 40L |
Effective treatment area of chamber | 300(L)×300(D)mm |
Number of air paths | 2-way gas, supporting oxygen, argon, nitrogen, hydrogen, etc. |
Plate spacing | 34mm (adjustable) |
Number of processing layers | 4 layers |
Control Mode | PLC+touch screen |
Power Supply | 220V |
Dimensions | 685mm(L) X 830m (w) X 1450mm (H) |
Plasma
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