cryogenic radio frequency Low pressure plasma cleaning equipment NE-PE80F
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DESCRIPTION

NE-PE80F vacuum plasma cleaning equipment is mainly composed of vacuum chamber, high-frequency plasma power supply, vacuum generation and measurement system, process gas system, control system and other parts. The basic working principle is to use a vacuum pump to evacuate the working room to a certain vacuum degree, and then introduce process gas. Under the action of the high-frequency generator, a high-frequency alternating electric field is formed between the anode and the cathode to ionize the gas and form plasma. When the gas reaches the plasma state, the gaseous molecules will split into many highly active particles. The mechanism of plasma cleaning relies on the "activation" of substances in the "plasma state" to achieve the purpose of removing stains on the surface of objects or improving surface activity. It can be used to improve the adhesion, hydrophilicity, printing and other properties of products, and can also be used to remove organic matter, oil stains, oxide layers and other pollutants on the surface of materials.

PARAMETER

ModelNE-PE80F
Plasma Generator Frequency
RF 13.56MHz automatic impedance matching
Ultimate vacuum degree1Pa
Vacuum PumpOil pump/dry pump (optional)
Power
500W/1000W(adjustable)
Chamber Material316 stainless steel/aluminum alloy (optional)
Chamber Size450(W)*465(D)*355(H)mm
Chamber Volume
80L
Effective treatment area of chamberW410mm x D390mm
Number of air paths2-way gas, supporting oxygen, argon, nitrogen, hydrogen, etc.
Plate spacing45mm (adjustable)
Number of processing layers6 layers
Control Mode
PLC+touch screen
Power SupplyAC380V,50/60Hz
Dimensions1100mm(L)×1145mm(W) ×1760 mm(H)


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Contact
  • +86 173 0440 3275
  • sales@naentech.cn
  • Huaming City, Guangming District, Shenzhen, Guangdong, China
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