NE-Q05 plasma cleaning machine adopts ICP inductively coupled external electrode plasma generation method, which is characterized by simple structure, high plasma density, no electrode inside the cavity, effectively avoiding electrode sputtering pollution, and the vacuum cavity adopts high-cleanliness quartz glass chamber, which is easy to clean and not easy to react with the product.

Plasma cleaning machines can not only enhance the adhesion, compatibility and wettability of samples, but also disinfect and sterilize samples. Currently, plasma cleaning technology has been widely used in optics, optoelectronics, electronics, material science, life science, polymer, biomedicine, microfluidics and other fields.