The whole system of NE-Q05H small plasma cleaning instrument includes vacuum chamber, radio frequency generator, vacuum pump and air inlet and outlet. The processor is a capacitive coupling external electrode type, and the processing chamber is a cylindrical quartz glass. The plasma discharge system is a 200W high-frequency oscillation power supply with a power frequency of 13.56MHz. In order to ensure that the power supply effectively supplies the discharge power, an impedance matcher is provided between the power supply and the discharge electrode. The processor of this equipment adopts an external electrode type, that is, the discharge energy is applied from the outside of the processor, which can avoid the corrosion of the electrode and the deposition of reactants on the plate.

Plasma cleaning technology utilizes the characteristics of low-temperature plasma to make the plasma contact and react with the material surface, so that the surface of the processed material can be chemically and physically cleaned, the surface wettability can be improved, or new chemical functional groups can be implanted and the surface can be etched.