DESCRIPTION
NE-PE100F is a large-scale industrial low pressure plasma treatment system, equipped with high power, large cavity, high density, high stability, for large-scale continuous production. It is used in a wide range of fields, from the manufacture of semiconductors and electronic components to medical applications. Plasma treatment cleans materials by decomposing and vaporizing microscopic organic matter adhering to the material surface. It also has the effect of surface modification by breaking molecular bonds on the material surface and changing the surface composition. In addition, the plasma decorates the surface of the material with hydroxyl groups, making it hydrophilic and less likely to repel liquids.
lt is widely used in scientific research institutions, enterprise R&D units and small batchproduction, including:
Plasma cleaning organics
Plasma surface activation to improve adhesion
Form new functional groups and improve hydrophilicityWafer Cleaning, remove the photoresist
ITO & FTO & Glass & Pottery &Metal
PP & PET & PVC & PEEK & PC
PARAMETER
Model | NE-PE100F |
Limiting vacuum | 1Pa |
Power Supply | AC380V,50/60Hz |
Touch screen | Touch screen 10’’ |
Power | 1000W (Adjustable) |
Frequency | 13.56Mhz |
Vacuum chamber material | 316 stainless steel, |
Vacuum chamber cavity size | 500(L)×500(D)×485(H)m 110L |
Gas channel | 2 channels(such as oxygen, argon, hydrogen, nitrogen, etc.) |
Overall dimensions | 930mm(L)×990mm(W) ×1754mm(H) |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
Plasma
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